OVPD technology

N. Meyer (1) , M. Rusu (2) , S. Wiesner (2) , S. Hartmann (3) , D. Keiper (1) , M. Schwambera (1) , M. Gersdorff (1) , M. Kunat (1) , M. Heuken (1) , W. Kowalsky (2) , M.Ch. Lux-Steiner (2)

1 AIXTRON AG
2 SE2 - Solarenergieforschung [Berlin]
3 Technische Universität Braunschweig = Technical University of Braunschweig [Braunschweig]

The precise control of organic thin film processing by organic vapor phase deposition (OVPD) is presented and analyzed on device level. OVPD offers accurate and individual control of deposition layer properties like mixing of several materials (co-deposition) and the control of various morphologies by a wide process parameter space given by, e.g. substrate temperature, deposition rate and pressure. The benefit of precise co-deposition is demonstrated by an OLED with a sensitive twofold-doped emissive layer and revealed a doping level of 0.26% for the red dopant with a std. dev. of 0.38%. The effect of the various morphologies is investigated by optimizing the efficiency of molecular organic solar cells consisting of copper phthalocyanine (CuPc) and C. With defined process parameters efficiencies of up to 3.0% were demonstrated.

Mots clés: Physical Sciences

N. Meyer, M. Rusu, S. Wiesner, S. Hartmann, D. Keiper, et al.. OVPD technology. European Physical Journal: Applied Physics, 2009, 46 (1), pp.1-4. ⟨10.1051/epjap/2009028⟩. ⟨hal-00480156⟩