INTERACTION BETWEEN GAS DIFFUSION AND MULTISTABLE HETEROGENEOUS CHEMICAL KINETICS IN C/C COMPOSITE PROCESSING - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2001

INTERACTION BETWEEN GAS DIFFUSION AND MULTISTABLE HETEROGENEOUS CHEMICAL KINETICS IN C/C COMPOSITE PROCESSING

Résumé

The sharpness of the smooth laminar/rough laminar (SL/RL) CVD/CVI pyrocarbon nanotexture transition is addressed in terms of a possible hysteretical chemical deposition mechanism, based on a bimolecular heterogeneous deposition reaction step. Interaction of the hysteretical heterogeneous chemistry with the diffusive transport of the source species enhances the parameter domain of hysteresis, and even better at high Thiele modulus values. A ``toy-model'' is also studied to explain such a behavior.
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Dates et versions

hal-00400022 , version 1 (17-08-2009)

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  • HAL Id : hal-00400022 , version 1

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Gerard L. Vignoles, Olivier Baconneau, Claude-Michel Brauner. INTERACTION BETWEEN GAS DIFFUSION AND MULTISTABLE HETEROGENEOUS CHEMICAL KINETICS IN C/C COMPOSITE PROCESSING. Fundamentals of Gas-Phase and Surface Chemistry of Vapor-Phase Deposition II/ Process Control, Diagnostics and Modeling in Semiconductor Manufacturing IV, Mar 2001, Washington, United States. pp.237--244. ⟨hal-00400022⟩

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