Atomic relaxation and dynamical generation of ordered and disordered chemical vapour infiltration (CVI) SiC polytypes
Résumé
The coexistence of ordered and disordered polytypes in SiC deposits is discussed from the point of view of their formation under CVD/CVI conditions, i.e., far from equilibrium. Local deformations at layer n are considered to determine the orientation and the deformations of the (n + l)th layer. An analysis of this dependence is made by constructing a first return map of an atomic relaxation variable, based on the ab initio calculation data for some regular polytypes made by Cheng et al., J. Phys. (Condens. Matter) 2 (1990) 5115. Orientation sequences are linked to the local deformation parameter, and to 29Si and 13C NMR shifts. iterations of this map are considered as a one-dimensional dynamical system simulating layer-by-layer growth. Depending on control parameters, the dynamical system exhibits stationary, periodic or chaotic orientation sequences, reproducing many experimentally obtained polytypes. The occurrence of CVD- or CVI-grown one-dimensionally disordered polytypes can thus possibly arise from a deterministic process able to yield also regular structures for nearby values of control parameters.
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