Surface characterization of imprinted resist during demolding above glass transition temperature

Tanguy Lévéder (1) , Stéfan Landis (1) , Laurent Davoust (2) , Sébastien Soulan (3) , Jean-Hervé Tortai (3) , Nicolas Chaix (3)

1 CEA-LETI - Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information
2 LEGI - Laboratoire des Écoulements Géophysiques et Industriels [Grenoble]
3 LTM - Laboratoire des technologies de la microélectronique

Nanoimprint lithography is a high resolution and low cost patterning technique. Many difficulties have been overcome from the process point of view. This article is dedicated to the resist pattern characterization when they are annealed above the glass transition temperature of the material. This approach may be directly transposed to imprint process optimization when the demolding scheme is performed above the glass transition temperature. Simple model describing shape evolution with temperature is proposed and correlation with demolding process is presented. The results showed that a stamp release well above glass transition temperature is possible and may slightly impact the initial imprinted shape. Furthermore, this work may be transposed to determine temperature evolution of polymer dynamic viscosity.

Domaines: Micro et nanotechnologies/Microélectronique; Mécanique des fluides [physics.class-ph]

Tanguy Lévéder, Stéfan Landis, Laurent Davoust, Sébastien Soulan, Jean-Hervé Tortai, et al.. Surface characterization of imprinted resist during demolding above glass transition temperature. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics, 2007, 25 (6), pp.2365-2369. ⟨10.1116/1.2799975⟩. ⟨hal-00266792⟩