Track-etched nanopores in spin-coated polycarbonate films applied as sputtering mask

Anne-Katrin Nix (1) , H.-G. Gehrke (1) , J. Krauser (2) , C. Trautmann (3) , A. Weidinger (4) , H. Hofsäss (1)

1 II. Physikalisches Institut [Göttingen]
2 Hochschule Harz
3 GSI - Helmholtz zentrum für Schwerionenforschung GmbH
4 HMI - Hahn-Meitner Institut

Thin polycarbonate films were spin-coated on silicon substrates and subsequently irradiated with 1-GeV U ions. The ion tracks in the polymer layer were chemically etched yielding nanopores of about 40 nm diameter. In a second process, the nanoporous polymer film acted as mask for structuring the Si substrate underneath. Sputtering with 5-keV Xe ions produced surface craters of depth ~150 nm and diameter ~70 nm. This arrangement can be used for the fabrication of track-based nanostructures with self-aligned apertures.

Mots clés: polycarbonate; ion track; etching; sputtering; swift heavy ion irradiation

Domaines: Physique Atomique [physics.atom-ph]

Anne-Katrin Nix, H.-G. Gehrke, J. Krauser, C. Trautmann, A. Weidinger, et al.. Track-etched nanopores in spin-coated polycarbonate films applied as sputtering mask. The Seventh International Symposium on Swift Heavy Ions in Matter, Jun 2008, Lyon, France. ⟨hal-00249369⟩