CAPACITIVE TEST-STRUCTURES DESIGN METHODOLOGY FOR THE EXTRACTION OF AIR-GAP AND DIELECTRIC THICKNESS OF A MEMS PROCESS

M. Bellei (1) , B. Margesin (1) , R. Gaddi (1) , A. Gnudi (1) , F. Giacomozzi (2)

1 ARCES - Advanced Research Center on Electronic Systems for Information and Communication Technologies E. De Castro [Bologna]
2 Istituto Trentina di Cultura ITC

The air-gap and dielectric thicknesses are key technology parameters of a micromachining fabrication process; their correct estimation is necessary for both good prediction of MEMS devices behavior and process monitoring. In this paper we present a methodology for their accurate quantification making use of capacitive test-structures, in order to allow automated data-extraction or, in general, capacitance measurements with standard lab instrumentation; the parameters are computed from measurements through a simple analytical model. Model validation and robustness to main parameters deviations and undesired mechanical effects are investigated by finite element analysis using CoventorWare_.

Mots clés: MEMS; air-gap; dielectric thickness; electrical characterization; micromachining

Domaines: Architectures Matérielles [cs.AR]

M. Bellei, B. Margesin, R. Gaddi, A. Gnudi, F. Giacomozzi. CAPACITIVE TEST-STRUCTURES DESIGN METHODOLOGY FOR THE EXTRACTION OF AIR-GAP AND DIELECTRIC THICKNESS OF A MEMS PROCESS. DTIP 2006, Apr 2006, Stresa, Lago Maggiore, Italy. 5 p. ⟨hal-00189308⟩