PARAMETRIC YIELD ANALYSIS OF MEMS VIA STATISTICAL METHODS

S.-P. Vudathu (1) , K.-K. Duganapalli (1) , Rainer Laur (1) , D. Kubalinska (2) , A. Bunse-Gerstner (2)

1 ITEM - Institute for Electromagnetic Theory and Microelectronics
2 ZeTeM

This paper considers a developing theory on the effects of inevitable process variations during the fabrication of MEMS and other microsystems. The effects on the performance and design yield of the microsystems devices are analyzed and presented. A novel methodology in the design cycle of MEMS and other microsystems is briefly introduced. This paper describes the initial steps of this methodology that is aimed at counteracting the parametric variations in the product cycle of microsystems. It is based on a concept of worst-case analysis that has proven successful in the parent IC technology. Issues ranging from the level of abstraction of the microsystem models to the availability of such models are addressed

Mots clés: MEMS; Microsystems; Statistical Methods; Yield Analsysis; Process parameter variations

Domaines: Architectures Matérielles [cs.AR]

S.-P. Vudathu, K.-K. Duganapalli, Rainer Laur, D. Kubalinska, A. Bunse-Gerstner. PARAMETRIC YIELD ANALYSIS OF MEMS VIA STATISTICAL METHODS. DTIP 2006, Apr 2006, Stresa, Lago Maggiore, Italy. 4 p. ⟨hal-00189260⟩