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hal-00157607v1
Communication dans un congrès
D. Aime, B. Froment, Florian Cacho, V. Carron, S. Descombes et al. Work function tuning dopant scanning and related effects in Ni fully silicided gate fro sub-45nm nodes CMOSElectron Devices Meeting, 2004. IEDM Technical Digest, 2004, IEEE, pp.87-90, 2004, 13-15 décembre 2004. <10.1109/IEDM.2004.1419073>
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