Optical Diagnostics of RF Argon and Xenon Magnetron Discharges

M. Dony , F. Debal , M. Wautelet , J. Dauchot , M. Hecq , J. Bretagne , Pascal Leray , André Ricard

A comparison of magnetron discharges in Ar and Xe gases with Al and BN targets has shown that a similar electron kinetic is producing about the same quantity of Ar and Xe metastable atoms: (1-3) ×1010 cm-3 at gas pressures of 25 and 100 mTorr and RF powers, W, from 5 to 50 watts. The electron density is varying as W12 in the two gases. The sputtering yields of Al and BN targets are lower in Xe than in Ar, by factors of 1.1–1.2 for Al and of 3 for BN.

Domaines: Articles anciens

M. Dony, F. Debal, M. Wautelet, J. Dauchot, M. Hecq, et al.. Optical Diagnostics of RF Argon and Xenon Magnetron Discharges. Journal de Physique III, 1997, 7 (9), pp.1869-1876. ⟨10.1051/jp3:1997228⟩. ⟨jpa-00249686⟩