Ultrafast laser writing deep inside silicon

Andong Wang (1) , Amlan Das (1) , Olivier Utéza (1) , David Grojo (1)

1 LP3 - Laboratoire Lasers, Plasmas et Procédés photoniques

We generate and apply ultrafast trains of infrared pulses with durations ranging from 200 fs to 3.5 ns. We show how this gives unique multi-timescale control parameters for improved energy deposition and reliable 3D laser writing deep inside silicon.

Domaines: Physique [physics]; Sciences de l'ingénieur [physics]

Andong Wang, Amlan Das, Olivier Utéza, David Grojo. Ultrafast laser writing deep inside silicon. ICALEO 2021, 2021, Orlando, United States. pp.#Micro191. ⟨hal-03613382⟩