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Ultra-clean high-mobility graphene on technologically relevant substrates

Abstract : 2-step chemical cleaning allows enhanced removal of polymeric residues from the surface of graphene, leading to significantly improved electrical and morphological properties.
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https://hal.archives-ouvertes.fr/hal-03556278
Contributor : Mohamed Haouas Connect in order to contact the contributor
Submitted on : Thursday, June 2, 2022 - 2:47:23 PM
Last modification on : Friday, June 10, 2022 - 10:53:15 AM
Long-term archiving on: : Saturday, September 3, 2022 - 7:36:01 PM

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Ayush Tyagi, Vaidotas Mišeikis, Leonardo Martini, Stiven Forti, Neeraj Mishra, et al.. Ultra-clean high-mobility graphene on technologically relevant substrates. Nanoscale, Royal Society of Chemistry, inPress, ⟨10.1039/d1nr05904a⟩. ⟨hal-03556278⟩

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