SPS-prepared targets for sputtering deposition of phase change films.

Marc Marie-Maurice Meledge Essi (1) , Pascal Yot (2) , Geoffroy Chevallier (3) , Claude Estournès (3) , Annie Pradel (2)

1 Laboratoire de Chimie des Matériaux Inorganiques
2 ICGM ICMMM - Institut Charles Gerhardt Montpellier - Institut de Chimie Moléculaire et des Matériaux de Montpellier
3 CIRIMAT - Centre interuniversitaire de recherche et d'ingenierie des matériaux

Phase-change materials like thin films from the systems [Ge1-xPbx]Te and Ge[Te1-xSex] are of interest for data storage. For these compositions amorphous materials can not be obtained by melt quenching. However, Suitable films can be obtained using RF sputtering. Spark plasma sintering (SPS) was used to densify the powders to obtain large targets. Synthesis conditions and characterisations of the targets are reported. Amorphous nano films were obtained using the sintered targets and characterised.

Mots clés: Phase-change materials; Chalcogenides; Spark plasma sintering; RF sputtering; Thin films; Nano materials

Domaines: Matériaux

Marc Marie-Maurice Meledge Essi, Pascal Yot, Geoffroy Chevallier, Claude Estournès, Annie Pradel. SPS-prepared targets for sputtering deposition of phase change films.. Digest Journal of Nanomaterials and Biostructures , 2011, 6 (4), pp.1777-1782. ⟨hal-03541269⟩