Ultra-high areal capacitance and high rate capability RuO2 thin film electrodes for 3D micro-supercapacitors

Bouchra Asbani; Gaetan Buvat; Jeremy Freixas; Marielle Huvé; David Troadec; Pascal Roussel; Thierry Brousse; Christophe Lethien

doi:10.1016/j.ensm.2021.07.038

Journal articles

Ultra-high areal capacitance and high rate capability RuO2 thin film electrodes for 3D micro-supercapacitors

Bouchra Asbani ^{1, 2} Gaetan Buvat ^{1, 2} Jeremy Freixas ^{1, 2, 3} Marielle Huvé ⁴ David Troadec ^{1, 5} Pascal Roussel ⁴ Thierry Brousse ^{3, 2} Christophe Lethien ^{1, 2, 6, 7}

1 IEMN - Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520

2 RS2E - Réseau sur le stockage électrochimique de l'énergie

3 IMN - Institut des Matériaux Jean Rouxel

4 UCCS - Unité de Catalyse et Chimie du Solide - UMR 8181

5 CMNF - IEMN - Centrale de Micro Nano Fabrication - IEMN

IEMN - Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520

6 IUF - Institut Universitaire de France

7 CSAM - IEMN - Circuits Systèmes Applications des Micro-ondes - IEMN

IEMN - Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520

Abstract : To power the next generation of miniaturized electronic devices, 3D micro-supercapacitors are a new class of millimeter scale electrochemical capacitors with superior storage performance than their planar counterparts. Nevertheless, it is mandatory to carefully match the dimensions of the 3D scaffold with the thickness of the electrochemically active electrode materials to take benefit from both the high capacitance values and the high rate capability of 3D micro-supercapacitors technology. Here we demonstrate how to design an efficient 3D electrode based on ruthenium oxide pseudocapacitive film (similar to 400 nm-thick) deposited on a robust 3D scaffold. '90% of the initial capacitance value is maintained during 10000 cycles. The proposed 3D RuO2 electrode exhibits remarkable areal capacitance values (similar to 4.5 Fcm(-2)) at 2 mVs(-1), while maintaining more than 2 Fcm(-2) at 100 mVs(-1) (10 s charge / discharge time), thus validating the design of ultra-high capacitance electrode with high rate capability.

Keywords : RuO2 Thin films Pseudocapacitance 3D micro-supercapacitor Rate capability

Document type :

Journal articles

Domain :

Physics [physics] / Condensed Matter [cond-mat] / Materials Science [cond-mat.mtrl-sci]

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https://hal.archives-ouvertes.fr/hal-03395314
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Submitted on : Friday, October 22, 2021 - 12:49:02 PM
Last modification on : Monday, May 16, 2022 - 9:03:32 AM

Ultra-high areal capacitance and high rate capability RuO2 thin film electrodes for 3D micro-supercapacitors

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Ultra-high areal capacitance and high rate capability RuO2 thin film electrodes for 3D micro-supercapacitors

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