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Communication Dans Un Congrès Année : 2021

Helium-charged aluminum and silicon films deposited by Direct Current Magnetron Sputtering

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Matériaux Plasmas
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hal-03343986 , version 1 (14-09-2021)

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  • HAL Id : hal-03343986 , version 1

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Sara Ibrahim, Pascal Brault, Amael Caillard, Thierry Sauvage, Pierre Desgardin, et al.. Helium-charged aluminum and silicon films deposited by Direct Current Magnetron Sputtering. PLATHINIUM 2021, Sep 2021, Online, France. ⟨hal-03343986⟩
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