How the chemical structure of the plasma-deposited SiOx film modifies its stability and barrier properties: FTIR study

Thanh Hien Tran (1) , D B Au (1) , B Diawara (2) , K Fatyeyeva (2) , S Marais (2) , Jose Ortiz (3) , Dominique Debarnot (1) , Fabienne Poncin-Epaillard (1)

1 IMMM - Institut des Molécules et Matériaux du Mans
2 INSA Rouen Normandie - Institut national des sciences appliquées Rouen Normandie
3 VIS - Valeo Vision [Bobigny]

Organosilicon thin films issued from the gas mixture of oxygen and hexamethyledisiloxane (HMDSO), 2,4,6,8-tetramethylcyclotetrasiloxane (TMCTS), or fluorotriethoxysilane (FTEOS) deposited on polycarbonate (PC) substrate were obtained thanks to a RF plasma source. The chemical structure of the two types of inorganic SiOx (HMDSO/O2, of the thin films surface and bulk, which stabilized after 15 days of storage. Such phenomenon is explained by the hydrophobicity recovery that may induce the observed network alteration. Water and oxygen permeation and transport properties of treated PC films were correlated with the coating structure and composition; then TMCTS was identified as the most efficient precursor for enhancing water barrier property. Furthermore, the permeation properties of these deposits seem to be more controlled by the material density than by their chemistry.

Mots clés: density; permeation; PECVD; inorganic silicon; fluorinated silicon

Domaines: Chimie

Thanh Hien Tran, D B Au, B Diawara, K Fatyeyeva, S Marais, et al.. How the chemical structure of the plasma-deposited SiOx film modifies its stability and barrier properties: FTIR study. Progress in Organic Coatings, 2019, 137, pp.105332. ⟨10.1016/j.porgcoat.2019.105332⟩. ⟨hal-03016560⟩