ALD Precursors Study on Structural and Thermal Characteristics of Heteroleptic Yttrium Complexes as Potential Precursors for Vapor Phase Deposition

Sebastian M J Beer (1) , Annika Krusenbaum (1) , Manuela Winter (1) , Constantin Vahlas (2) , Anjana Devi (1)

1 RUB - Ruhr University Bochum = Ruhr-Universität Bochum
2 CIRIMAT - Centre interuniversitaire de recherche et d'ingenierie des matériaux

Yttrium oxide (Y 2 O 3) thin films are implemented as a functional component in a broad field of applications such as optics, electronics or thermal barrier coatings. Atomic layer deposition (ALD) is a promising technique to fabricate high-quality thin films with atomic level precision in which the precursor choice plays a crucial role in process development. The limited number of suitable yttrium precursors available for ALD of Y 2 O 3 has triggered increasing research activity seeking new or modified precursors. In this study, heteroleptic compounds of yttrium bearing the cyclopentadienyl (Cp) ligand in combination with the chelating amidinate or guanidinate ligands were targeted as potential precursors for ALD. In this context, a systematic and comparative study of the structure and thermal characteristics of (bis-cyclopentadienyl-(N,N′-diisopropyl-2

Domaines: Matériaux

Sebastian M J Beer, Annika Krusenbaum, Manuela Winter, Constantin Vahlas, Anjana Devi. ALD Precursors Study on Structural and Thermal Characteristics of Heteroleptic Yttrium Complexes as Potential Precursors for Vapor Phase Deposition. European Journal of Inorganic Chemistry, 2020, ⟨10.1002/ejic.202000436⟩. ⟨hal-02962225⟩