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Communication Dans Un Congrès Année : 2017

2 Dimensional PIC/MCC simulations of RF CCPs with dielectric side wall: non-uniformity in electron heating

Résumé

Previously plasma non-uniformities in Capacitively Coupled Plasmas were thought to be caused by either an enhanced electric field caused by the proximity of two electrodes, or by an electromagnetic standing wave effect when the exciting frequency is high. We have developed a Particle-In-Cell/Monte Carlo Collision code in 2D Cartesian frame with a dielectric wall at the reactor edge, aiming to investigate the plasma uniformity when the enhanced electric field is shielded by a thick dielectric. Nevertheless, we still observed that the electron density, time-averaged electron power deposition and ionization rate all are non-uniform, with maxima adjacent to x he dielectric edge. The axially-integrated electron power density peaks closer to this edge than the electron density. Electrons are predominantly heated by the axial electric field, Ez, which has strong RF oscillations while Ex is essentially DC. By calculating different components of the electron heating and using an analytical model, we found that this non-uniformity in electron heating results from enhanced Ohmic heating as electron density decreases towards the x edge.
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Dates et versions

hal-02593707 , version 1 (15-05-2020)

Identifiants

  • HAL Id : hal-02593707 , version 1

Citer

Yue Liu, Jean-Paul Booth, Pascal Chabert. 2 Dimensional PIC/MCC simulations of RF CCPs with dielectric side wall: non-uniformity in electron heating. International Workshop on Radio-Frequency Plasmas, May 2017, Presqu’ile de Giens, France. ⟨hal-02593707⟩
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