Evaluation of a Metal Supported Ni-YSZ / YSZ / La2NiO4 IT-SOFC Elaborated by Physical Surface Deposition Processes

Jérémie Fondard (1, 2) , Pierre Bertrand (1) , Alain Billard (1, 2, 3) , Stefan Skrabs (4) , Thomas Franco (4) , Sébastien Fourcade (5) , Pierre Batocchi (5) , Fabrice Mauvy (5) , Ghislaine Bertrand (6) , Pascal Briois (1, 2)

1 IRTES - LERMPS - Laboratoire d'Études et de Recherches sur les Matériaux, les Procédés et les Surfaces
2 FCLAB - Fuel Cell LAB : Vers des Systèmes Pile à Combustible Efficients
3 CEA - Commissariat à l'énergie atomique et aux énergies alternatives
4 Plansee Metall GmbH.
5 ICMCB - Institut de Chimie de la Matière Condensée de Bordeaux
6 CIRIMAT - Centre interuniversitaire de recherche et d'ingenierie des matériaux

The elaboration of the last generation metal supported IT-SOFC complete cell by dry surface deposition processes is really challenging. Atmospheric Plasma Spraying (APS) and Reactive Magnetron Sputtering (RMS) processes are respectively adapted to deposit Ni-YSZ anode and YSZ electrolyte layers. RMS is also used to coat a thin and dense La2NiO4 (LNO) cathode layer. In this work, we have elaborated a complete cell on metallic support(ITM) produced by PLANSEE SE. The innovative LNO cathode layer was compared with screen-printed LNO layers, with and without RMS bonding layer. Electrochemical and Voltametry testswere performed on these samples. These revealed lower performances than literature due to the high density of the RMS cathode layer, and too high a temperature during sintering step which deteriorate layers manufactured by RMS and metallic substrate. Nevertheless, using LNO bonding layer manufactured by RMS seems to be an interesting way to improve the polarization resistance of the cell.

Mots clés: Atmospheric Plasma Spraying (APS)- Reactive Magnetron Sputtering (RMS); Physical Surface; Electrochemical

Domaines: Matériaux

Jérémie Fondard, Pierre Bertrand, Alain Billard, Stefan Skrabs, Thomas Franco, et al.. Evaluation of a Metal Supported Ni-YSZ / YSZ / La2NiO4 IT-SOFC Elaborated by Physical Surface Deposition Processes. ECS Transactions, 2015, 68 (1), pp.2303-2316. ⟨10.1149/06801.2303ecst⟩. ⟨hal-02524649⟩