Interaction of Stearic Acid Deposited on Silicon Samples With Ar/N 2 and Ar/O 2 Atmospheric Pressure Microwave Post-discharges

Cédric Noël (1) , David Duday (2) , Stéphane Verdier , Patrick Choquet (3) , Thierry Belmonte (1) , Henri-Noël Migeon (3)

1 IJL - Institut Jean Lamour
2 Centre de Recherche Public - Gabriel Lippmann (LUXEMBOURG)
3 LIST - Luxembourg Institute of Science and Technology

Domaines: Plasmas

Cédric Noël, David Duday, Stéphane Verdier, Patrick Choquet, Thierry Belmonte, et al.. Interaction of Stearic Acid Deposited on Silicon Samples With Ar/N 2 and Ar/O 2 Atmospheric Pressure Microwave Post-discharges. Plasma Processes and Polymers, 2009, 6 (S1), pp.S187-S192. ⟨10.1002/ppap.200930506⟩. ⟨hal-02447134⟩