Sub-10 nm Block Copolymer Lithography: Sequential Infiltration Synthesis into Poly(Styrene)-block-Maltoheptaose

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https://hal.archives-ouvertes.fr/hal-02352917
Contributor : Issei Otsuka <>
Submitted on : Thursday, November 7, 2019 - 9:51:59 AM
Last modification on : Saturday, November 9, 2019 - 1:14:07 AM

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Anette Löfstrand, Dmitry B. Suyatin, Nicklas Nilsson, Issei Otsuka, A. Kvennefors, et al.. Sub-10 nm Block Copolymer Lithography: Sequential Infiltration Synthesis into Poly(Styrene)-block-Maltoheptaose. The 5th DSA Symposium, Oct 2019, Milan, Italy. ⟨hal-02352917⟩

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