On the Mechanism of In Nanoparticle Formation by Exposing ITO Thin Films to Hydrogen Plasmas

Zheng Fan (1) , Jean-Luc Maurice (1) , Wanghua Chen (1) , Stephane Guilet (2) , Edmond Cambril (3) , Xavier Lafosse (2) , Laurent Couraud , Kamel Merghem (2) , Linwei Yu (4) , Sophie Bouchoule (2) , Pere Roca I Cabarrocas (1)

1 LPICM - Laboratoire de physique des interfaces et des couches minces [Palaiseau]
2 LPN - Laboratoire de photonique et de nanostructures
3 L2M - Laboratoire de Microstructures et de Microélectronique
4 CIEE - College of Information and Electrical Engineering [Beijing]

Domaines: Science des matériaux [cond-mat.mtrl-sci]

Zheng Fan, Jean-Luc Maurice, Wanghua Chen, Stephane Guilet, Edmond Cambril, et al.. On the Mechanism of In Nanoparticle Formation by Exposing ITO Thin Films to Hydrogen Plasmas. Langmuir, 2017, 33 (43), pp.12114-12119. ⟨10.1021/acs.langmuir.7b01743⟩. ⟨hal-02349142⟩