HfO2 Etching by Pulsed BCl3/Ar Plasma

Paul Bodart (1) , Camille Petit-Etienne (1) , Gilles Cunge (1) , Francois Boulard (1) , Maxime Darnon (1) , Laurent Vallier (1) , Erwine Pargon (1) , Samer Banna (2) , Thorsten Lill (2) , Olivier Joubert (1)

1 LTM - Laboratoire des technologies de la microélectronique
2 Applied Materials, Santa Clara

Domaines: Micro et nanotechnologies/Microélectronique

Paul Bodart, Camille Petit-Etienne, Gilles Cunge, Francois Boulard, Maxime Darnon, et al.. HfO2 Etching by Pulsed BCl3/Ar Plasma. AVS 58h international symposium, Oct 2011, Nashville, United States. ⟨hal-02339988⟩