Charges injection investigation at metal/dielectric interfaces by Kelvin Probe Force Microscopy

Florian Mortreuil (1) , Christina Villeneuve-Faure (2) , Laurent Boudou (2) , Kremena Makasheva (3) , G. Teyssedre (2)

1 LAPLACE - LAboratoire PLasma et Conversion d'Energie
2 LAPLACE-DSF - Diélectriques Solides et Fiabilité
3 LAPLACE-MPP - Matériaux et Procédés Plasmas

Charges injection at metal/dielectric interface and their motion in silicon nitride layer is investigated using samples with embedded lateral electrodes and surface potential measurement by Kelvin Probe Force Microscopy (KPFM). Bipolar charge injection was evidenced using this method. From surface potential profile, charge density distribution is extracted by using Poisson's equation. The evolution of the charge density profile with polarization bias and depolarization time was also investigated.

Mots clés: charge injection; Kelvin Probe Force Microscopy; charges density profile; thin dielectric

Domaines: Sciences de l'ingénieur [physics]

Florian Mortreuil, Christina Villeneuve-Faure, Laurent Boudou, Kremena Makasheva, G. Teyssedre. Charges injection investigation at metal/dielectric interfaces by Kelvin Probe Force Microscopy. 2016 IEEE International Conference on Dielectrics (ICD), Jul 2016, Montpellier, France. pp.493-496, ⟨10.1109/ICD.2016.7547650⟩. ⟨hal-02324471⟩