Study of required conditions to limit the dielectric charging phenomenon when measuring the electron emission yield from thin dielectric layers

Charles Rigoudy (1, 2) , Kremena Makasheva (2) , G. Teyssedre (1) , Laurent Boudou (1) , M. Belhaj (3) , S. Dadouch (3)

1 LAPLACE-DSF - Diélectriques Solides et Fiabilité
2 LAPLACE-ScIPRA - Sciences et Ingénierie des Plasmas Réactifs et des Arcs
3 DPHY, ONERA, Université de Toulouse [Toulouse]

The electron emission yield of materials is an important quantity to be determined in various fields of physics. Among them, dielectric materials have a strong ability to retain charges and remain charged when submitted to electrical field, in particular when irradiated by electron beam. Without the use of specific measurement methodology, experimental investigation of dielectric materials may lead to an inaccurate measurement of the total electron emission yield (TEEY). This paper shows that a particular attention should be paid to the pulse duration of the incident electron beam and to hysteresis effects induced by charge trapping.

Mots clés: thin layers; electron emission; dielectric charging

Domaines: Sciences de l'ingénieur [physics]

Charles Rigoudy, Kremena Makasheva, G. Teyssedre, Laurent Boudou, M. Belhaj, et al.. Study of required conditions to limit the dielectric charging phenomenon when measuring the electron emission yield from thin dielectric layers. 2018 IEEE 2nd International Conference on Dielectrics (ICD), Jul 2018, Budapest, Hungary. pp.1-4, ⟨10.1109/ICD.2018.8468360⟩. ⟨hal-02324382⟩