Nitric Oxide absolute density distribution of an Ar APPJ: effect of gas flow and substrate

Sylvain Iseni (1, 2) , Shiqian Zhang (3) , Bram Van Gessel (3) , Sven Hofmann (3) , Ben Van Ham (3) , Stephan Reuter (1, 2) , Klaus-Dieter Weltmann (1) , Peter J. Bruggeman (3)

1 INP - Leibniz Institute for Plasma Science and Technology
2 The center for innovation competence (ZIK) plasmatis
3 Department of Applied Physics [Eindhoven]

Domaines: Physique des plasmas [physics.plasm-ph]; Plasmas; Milieux fluides et réactifs; Chimie-Physique [physics.chem-ph]; Optique / photonique

Sylvain Iseni, Shiqian Zhang, Bram Van Gessel, Sven Hofmann, Ben Van Ham, et al.. Nitric Oxide absolute density distribution of an Ar APPJ: effect of gas flow and substrate. Workshop MP1101 European COST Action - Bioplasma, 2014, Paris, France. ⟨hal-02288849⟩