Giant dielectric constant in TiO 2 /Al 2 O 3 nanolaminates grown on doped silicon substrate by pulsed laser deposition

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Contributor : Ulrike Lüders <>
Submitted on : Wednesday, August 14, 2019 - 4:24:44 PM
Last modification on : Friday, August 16, 2019 - 1:17:51 AM

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Ulrike Luders, P. Walke, R. Bouregba, A. Lefèvre, G. Parat, et al.. Giant dielectric constant in TiO 2 /Al 2 O 3 nanolaminates grown on doped silicon substrate by pulsed laser deposition. Journal of Applied Physics, American Institute of Physics, 2014, 115 (9), pp.094103. ⟨10.1063/1.4867780⟩. ⟨hal-02266504⟩

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