Photopatternable High-k Fluoropolymer Dielectrics Bearing Pendent Azido Groups

Abstract : Photopatternable fluoropolymers with high dielec. const. were prepd. by direct azidation of com. available poly(vinylidene fluoride-​trifluoroethylene-​chlorotrifluoroethylene)​. The produced fluoropolymers exhibit very high dielec. const., while being photopatternable without the use of any additives. These cross-​linked polymers appear to have reduced crystallinity compared to the pristine ones, as crosslinking is known to introduce defects in the polymer conformation, leading to a redn. in crystallinity. Crosslinking can occur both thermally and photochem. because of the presence of the pendent azido groups, which upon heating or irradn. with UV light release nitrogen and act as crosslinking sites. The cross-​linked films exhibit excellent dielec. properties which greatly depend on the reaction conditions. Appropriate photolithog. protocols have been developed to obtain excellent quality patterned films using the azide-​contg. fluoropolymer as neg. photoresist.
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Konstantinos Kallitsis, Damien Thuau, Thibaut Soulestin, Cyril Brochon, Eric Cloutet, et al.. Photopatternable High-k Fluoropolymer Dielectrics Bearing Pendent Azido Groups. Macromolecules, American Chemical Society, 2019, 52 (15), pp.5769-5776. ⟨10.1021/acs.macromol.9b00508⟩. ⟨hal-02265718⟩



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