Atomic Layer Deposition, a Key Technique for Processing Thin-Layered SOFC Materials - Case Of Epitaxial Thin Layers of CeO2 Catalyst

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https://hal.archives-ouvertes.fr/hal-02263473
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Submitted on : Sunday, August 4, 2019 - 9:48:23 PM
Last modification on : Wednesday, August 21, 2019 - 6:22:03 PM

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A. Marizy, T. Desaunay, D. Chery, Pascal Roussel, A. Ringuedé, et al.. Atomic Layer Deposition, a Key Technique for Processing Thin-Layered SOFC Materials - Case Of Epitaxial Thin Layers of CeO2 Catalyst. ECS Transactions, Electrochemical Society, Inc., 2013, 57 (1), pp.983-990. ⟨10.1149/05701.0983ecst⟩. ⟨hal-02263473⟩

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