Determination of residual stress fields in a thermally grown oxide under thermal cycling loadings, using XRD and Raman spectroscopy. Correlations with microstructural states

F. Rakotovao (1) , Zhaojun Tao (2) , Jean-Luc Grosseau-Poussard (1) , Benoît Panicaud (2) , Bonnet Gilles (1) , P. Girault (1) , M. Guerain (1)

1 LaSIE - Laboratoire des Sciences de l'Ingénieur pour l'Environnement - UMR 7356
2 LASMIS - Laboratoire des Systèmes Mécaniques et d'Ingénierie Simultanée

The presence of residual stresses in thermal oxide layers has been recognized for a long time. In the present work, the mechanical fields for chromia oxide are determined either by XRD or Raman spectroscopy. In addition, the microstructure of the chromia films is investigated ant its influence on the evolution of the stress release processes is analyzed. © (2014) Trans Tech Publications, Switzerland.

Domaines: Mécanique des matériaux [physics.class-ph]

F. Rakotovao, Zhaojun Tao, Jean-Luc Grosseau-Poussard, Benoît Panicaud, Bonnet Gilles, et al.. Determination of residual stress fields in a thermally grown oxide under thermal cycling loadings, using XRD and Raman spectroscopy. Correlations with microstructural states. Advanced Materials Research, 2014, 996, pp.890--895. ⟨10.4028/www.scientific.net/AMR.996.890⟩. ⟨hal-02182103⟩