Advanced multilayer metallization schemes with copper as interconnection metal, Thin Solid Films, vol.236, pp.257-266, 1993. ,
New method for in situ control of Bragg reflector fabrication, Appl. Phys. Lett, vol.68, pp.2335-2336, 1996. ,
URL : https://hal.archives-ouvertes.fr/hal-02058644
Deposition of SiO2 and TiO2 thin films by plasma enhanced chemical vapor deposition for antireflection coating, J. Non-Cryst. Solids, vol.216, pp.77-82, 1997. ,
Morphology and gas barrier properties of thin SiOx coatings on polycarbonate: correlations with plasma-enhanced chemical vapor deposition conditions, J. Mater. Res. Pittsburgh, vol.15, pp.704-717, 2000. ,
Smooth and self-similar SiO2-llke films on polymers synthesized In roll-to-roll atm00pheric pressure-PECVD for gas diffusion barrier applications, Plasma Process. Polym, vol.7, pp.635-639, 2010. ,
DOI : 10.1002/ppap.200900179
Development and characterization of sillca-based membranes for hydrogen separation, J. Porous. Mater, vol.15, pp.551-557, 2008. ,
Development of a kinetic model for the moderate temperature chemical vapor deposltlon of Si02 films from tetraethyl orthosilicate and oxygen, AI CHE J, vol.64, pp.3958-3966, 2018. ,
PlasmaAssisted Chemical Vapor Deposition and Characterization of High Quality Silicon Oxide Films, Thin Solid Films, vol.194, issue.90, p.90211, 1990. ,
Inorganic to organic crossover in thin films deposited from O2/Tl!OS plasmas, J. Ncn-Cryst. Solids, vol.272, pp.163-173, 2000. ,
Investigation of SiO2 plasma enhanced chemical vapor deposition through tetraethoxysilane using attenuated total reflection Fourier transform infrared spectrOSCOpy, J. Vac. Sci. Technol. A, vol.13, pp.2355-2367, 1995. ,
Comparative study of ALD Si02 thin films for optical applications, Opt. Mater. Express, vol.6, 2016. ,
Changes in morphology and ionic transport induced by ALD SiO2 coating of nanoporous alumina membranes, ACS Appl. Mater. lnteifaces, vol.5, pp.3556-3564, 2013. ,
Comparison of properties of dielectric films deposited by various methods, J. Vac. Sd. Technol, vol.14, pp.1064-1081, 1977. ,
Phcnons In AX2 glasses: from molecular to band-like modes, Phys. Rev. B, vol.15, pp.4030-4038, 1977. ,
DOI : 10.1103/physrevb.15.4030
Band limits and the vibrational spectra ,:J tetrahedral glasses, Phys. Rev. B, vol.19, pp.4292-4297, 1979. ,
DOI : 10.1103/physrevb.19.4292
J vlbratlcnal excitations In vitreous silica, Phys. Rev. B, vol.56, pp.8605-8622, 1997. ,
Thermal Annealing Effects on the Mechanical Properties of PlasmaEnhanced Chemical Vapor Deposited Silicon Oxide Films, vol.139, pp.1730-1735, 2000. ,
Disorder-induced vibration-mode coupling in SiO2 films observed under normal-incidence infrared radiation, Phys. Rev. B, vol.50, pp.4881-4884, 1994. ,
Order disorder transitions and evolution of silica structure in self-assembled Mesostructured silica films studied through FTIR spectroscopy, J. Phys. Chem. B, vol.107, pp.4711-4717, 2003. ,
Evidence for disorder-induced vibrational mode coupling in thin amorphous SiO2 films, J. Appl. Phys, vol.66, pp.201-204, 1989. ,
DOI : 10.1063/1.344472
Quantitative analysis of the effect of disorder-induced mode coupling on infrared absorption in silica, Phys. Rev. B, vol.38, pp.1255-1273, 1988. ,
Vibrational modes in amorphous silicon dioxide, Phys. B, vol.292, pp.286-295, 2000. ,
The effect of thermal annealing on aerosol-gel deposited SiO2 films: a FTIR deconvolution study, Thin Solid Films, vol.310, pp.340-344, 1997. ,
A simple model to analyze vibrationally decoupled modes on SiO2 glasses, J. Mol. Struct, vol.641, pp.243-250, 2002. ,
Transmission infrared study of acid-catalyzed sol-gel silica coatings during room ambient drying, J. Mater. Res, vol.7, pp.2230-2239, 1992. ,
Infrared spectroscopic study of SiOx films produced by plasma enhanced chemical vapor deposition, J. Vac. Sci. Technol, vol.4, pp.689-694, 1986. ,
Characterization of silicon dioxide films deposited at low pressure and temperature in a helicon diffusion reactor, J. Vac. Sci. Technol, vol.11, pp.2954-2963, 1993. ,
The defect structure of sol-gel-derived silica/polytetrahydrofuran hybrid films by FTIR, J. Non-Cryst. Solids, vol.283, pp.144-154, 2001. ,
Effects of the nearest neighbors and the alloy matrix on SiH stretching vibrations in the amorphous SiOr:H (0 < r < 2) alloy system, Phys. Rev. B, vol.40, pp.1795-1805, 1989. ,
IR study on the structural evolution of sol-gel derived SiO2 gels in the early stage of conversion to glasses, J. Non-Cryst. Solids, vol.126, pp.68-78, 1990. ,
Polarized Raman spectroscopy of v-SiO2 under rare-gas compression, Phys. Rev. B, vol.93, pp.1-9, 2016. ,
URL : https://hal.archives-ouvertes.fr/hal-01909031
Evidence for oxidation growth at the oxide-silicon Interface from controlled etch studies, J. Electrochem. Soc, vol.111, pp.872-873, 1964. ,
Analysis of the vibrational mode spectra of amorphous SiO2 films, J. Appl. Phys, vol.77, pp.4343-4348, 1995. ,
Characterisation of mesostructured TiO2thin layers by ellipsometric porosimetry, Thin Solid Films, vol.495, pp.232-236, 2006. ,
URL : https://hal.archives-ouvertes.fr/hal-00080025
Porosimetry measurements on low dielectric constant-thin layers by coupling spectroscopic ellipsometry and solvent adsorption-desorption, J. Porous. Mater, vol.12, pp.113-121, 2005. ,
URL : https://hal.archives-ouvertes.fr/hal-00077994
, , 1997.
A study of thin silicon dioxide films using infrared absorption techniques, J. Appl. Phys, vol.53, pp.4166-4172, 1982. ,
Hydrophobic silica membranes for gas separation, J. Memb. Sci, vol.158, issue.99, pp.35-41, 1999. ,
Growth of mixedphase amorphous and ultra nanocrystalline silicon thin films in the low pressure regime by a VHF PECVD process, Silicon, issue.4, pp.127-135, 2012. ,
Analysis of SiH vibrational absorption in amorphous SiOx:H (0?x?2.0) alloys in terms of a charge-transfer model, Appl. Phys. Lett, vol.63, pp.162-164, 1993. ,
Study of ultrathin silicon oxide films by FTIR-ATR and ARXPS after wet chemical cleaning processes, Surf. Interface Anal, vol.34, pp.445-450, 2002. ,
Infrared spectroscopy of sol-gel derived silica-based films: a spectramicrostructure overview, J. Non-Cryst. Solids, vol.316, pp.309-319, 2003. ,
Relationship between infrared absorption and porosity in silica-based sol-gel films, SPIE, vol.2288, pp.678-687, 1994. ,
The effect of post-deposition thermal processing on MOS gate oxides formed by remote PECVD, J. Electron. Mater, vol.19, pp.151-158, 1990. ,
Reaction Mechanisms of Plasma-and Thermal-Assisted Chemical Vapor deposition of Tetraethylorthosilicate Oxide Films, J. Electrochem. Soc, vol.137, pp.2209-2215, 1990. ,
Characterization of high rate deposited PECVD silicon dioxide films for MCM applications, J. Electrochem. Soc, vol.142, pp.3864-3869, 1995. ,
Heat treatment of spun-on acid-catalyzed sol-gel silica films, J. Mater. Res, vol.9, pp.723-730, 1994. ,
Annealing study of the infrared absorption in an amorphous silicon dioxide film, J. Non-Cryst. Solids, vol.114, pp.90616-90625, 1989. ,
Plasmaassisted chemical vapor deposition and characterization of high quality silicon oxide films, Thin Solid Films, vol.194, p.90211, 1990. ,
Effects of thermal history on stress-related properties of very thin films of thermally grown silicon dioxide, J. Vac. Sci. Technol. B, vol.7, pp.153-162, 1989. ,
Optical dispersion analysis within the IR range of thermally grown and TEOS deposited SiO2 films, Microelectron. Reliab, vol.39, pp.285-289, 1999. ,
Comparison of FTIR transmission spectra of thermally and LPCVD SiO2 films grown by TEOS pyrolysis, J. Electro. Soc, vol.151, pp.93-97, 2004. ,
Planar rings in glasses, Solid State Commun, vol.44, pp.90329-90334, 1982. ,
Characterization of thermal and deposited thin oxide layers by longitudinal optical-transverse optical excitation in fourier transform IR transmission measurements, Thin Solid Films, vol.174, pp.90885-90892, 1989. ,
Infrared absorption at longitudinal optic frequency in cubic crystal films, Phys. Rev, vol.130, pp.2193-2198, 1963. ,
Optical properties of thin films and the Berreman effect, Appl. Phys. A Solids Surfaces, vol.38, pp.263-267, 1985. ,
Mechanical properties of mesoporous silica thin films: effect of the surfactant removal processes, Thin Solid Films, vol.495, pp.210-213, 2006. ,
URL : https://hal.archives-ouvertes.fr/hal-00083088
Detection of LO and TO phonons in amorphous SiO2 films by oblique incidence of IR light, Phys. Status Solidi, vol.233, 1981. ,
Thermal and plasma enhanced atomic layer deposition of SiO2using commercial silicon precursors, Thin Solid Films, vol.558, pp.93-98, 2014. ,
Optical and chemical characterization of expanding thermal plasma-deposited carbon-containing silicon dioxide-like films, Thin Solid Films, vol.516, pp.8547-8553, 2008. ,
The thermodynamic properties of tetraethoxysilane (TEOS) and an infrared study of its thermal decomposition, J. Phys. IV, vol.03, pp.75-82, 1993. ,
URL : https://hal.archives-ouvertes.fr/jpa-00251366
Optical and compositional study of silicon oxide thin films deposited in a dual-mode (microwave/radiofrequency) plasma-enhanced chemical vapor deposition reactor, J. Appl. Phys, vol.83, pp.5224-5232, 1998. ,
Water-induced room-temperature oxidation of Si-H and -Si-Sibonds in silicon oxide, J. Appl. Phys, vol.80, pp.1171-1176, 1996. ,
Reaction pathways and sources of OH groups in low temperature remote PECVD silicon dioxide thin films, J. Electron. Mater, vol.19, pp.209-217, 1990. ,
Thermal desorption and infrared studies of plasma-enhanced chemical vapor deposited SiO films with tetraethylorthosilicate, Jpn. J. Appl. Phys, vol.32, pp.1787-1793, 1993. ,
Ultramicroporous" silica-based supported inorganic membranes, J. Memb. Sci, vol.77, issue.93, pp.85067-85074, 1993. ,
Molecular simulation of the phase behavior of water confined in silica nanopores, J. Phys. Chem. C, vol.111, pp.7938-7946, 2007. ,
Influence of low-temperature chemical vapor deposited SiO [sub 2] capping layer porosity on GaAs/AlGaAs quantum well intermixing, Electrochem. Solid-State Lett, vol.3, pp.196-199, 2000. ,
Local atomic structure of thermally grown, Phys. Chem, pp.139-148, 1988. ,
In situ ellipsometry and infrared analysis of PECVD SiO 2 films deposited in an O2/TEOS helicon reactor, J. Non-Cryst. Solids, vol.216, pp.48-54, 1997. ,
Low temperature deposition: properties of SiO2 Tilms from TEOS and ozone by APCVD system, J. Phys. Conf. Ser, vol.167, pp.1-6, 2009. ,