Field Evaporation Behavior of Metal Oxide/Metal Interfaces

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Journal articles
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https://hal.archives-ouvertes.fr/hal-02107553
Contributor : François Vurpillot <>
Submitted on : Tuesday, April 23, 2019 - 4:48:53 PM
Last modification on : Friday, July 5, 2019 - 5:24:12 PM

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Mukesh Bachhav, François Vurpillot, Frederic Danoix, Raphaële Danoix, Béatrice Hannoyer, et al.. Field Evaporation Behavior of Metal Oxide/Metal Interfaces. Microscopy and Microanalysis, Cambridge University Press (CUP), 2016, 22 (S3), pp.678-679. ⟨10.1017/S1431927616004244⟩. ⟨hal-02107553⟩

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