Effect of deposition conditions on microstructure of LiPON films obtained by rf magnetron sputtering

L. Kovalenko (1) , O. V'Yunov (1) , A. Belous (1) , F. Goutenoire (2) , Veyis Gunes (2) , O. Bohnke (2)

1 V.I. Vernadskii Institute of General and Inorganic Chemistry
2 IMMM - Institut des Molécules et Matériaux du Mans

Thin conductive amorphous lithium phosphorous oxynitride (LiPON) films were prepared by rf magnetron sputtering in various experimental conditions. rf power, temperature of substrate, pressure of working gas and deposition time were varied. The microstructure of the films has been investigated by scanning electron microscopy and phosphorous mappings. The optimal conditions of reactive sputtering have been determined, which allows the formation of dense, homogeneous, free of cracks, amorphous thin LiPON films, and stable under ambient atmosphere. An ionic conductivity of 3.2·10 -6 S·cm -1 at room temperature has been determined by impedance spectroscopy.

Mots clés: LiPON films; RF magnetron sputtering; SEM; impedance spectroscopy

Domaines: Chimie; Matériaux; Micro et nanotechnologies/Microélectronique

L. Kovalenko, O. V'Yunov, A. Belous, F. Goutenoire, Veyis Gunes, et al.. Effect of deposition conditions on microstructure of LiPON films obtained by rf magnetron sputtering. 2014 IEEE 34th International Conference on Electronics and Nanotechnology (ELNANO), Apr 2014, Kyiv, France. pp.126-130, ⟨10.1109/ELNANO.2014.6873952⟩. ⟨hal-02074359⟩