Expanding Plasma Process for Nitriding Mo–Ti Bilayer Thin Films

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https://hal.archives-ouvertes.fr/hal-02015152
Contributor : Jean-Louis Jauberteau <>
Submitted on : Tuesday, February 12, 2019 - 9:01:34 AM
Last modification on : Thursday, February 28, 2019 - 1:15:44 AM

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  • HAL Id : hal-02015152, version 1

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Isabelle Jauberteau, Richard Mayet, Julie Cornette, Pierre Carles, Denis Mangin, et al.. Expanding Plasma Process for Nitriding Mo–Ti Bilayer Thin Films. Coatings, MDPI, 2019, 9 (2), pp.96. ⟨hal-02015152⟩

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