X-ray photoelectron diffraction study of thin Al 2 O 3 films grown on Si(111) by molecular beam epitaxy

M. El Kazzi , G. Grenet (1) , C. Merckling , Guillaume Saint-Girons (1) , C. Botella (1) , O. Marty (2) , G. Hollinger (1)

1 INL - H&N - INL - Hétéroepitaxie et Nanostructures
2 LENAC - Laboratoire d'Electronique, Nanotechnologies, Capteurs

Domaines: Science des matériaux [cond-mat.mtrl-sci]

M. El Kazzi, G. Grenet, C. Merckling, Guillaume Saint-Girons, C. Botella, et al.. X-ray photoelectron diffraction study of thin Al 2 O 3 films grown on Si(111) by molecular beam epitaxy. Physical Review B: Condensed Matter and Materials Physics (1998-2015), 2009, 79 (19). ⟨hal-01939930⟩