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Poster De Conférence Année : 2017

INCREASE OF THE NICKEL TARGET TEMPERATURE IN MAGNETRON SPUTTERING

Résumé

A Ni target has been disconnected from a water-cooled magnetron in order to induce a rise of its temperature. The time evolutions of the cathode voltage, of the target temperature, of the magnetic field and of the infrared radiation emitted by the target were investigated. An increase in the deposition rate and a change in the thin film microstructure has been observed.

Domaines

Matériaux
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Dates et versions

hal-01920292 , version 1 (23-11-2018)

Identifiants

  • HAL Id : hal-01920292 , version 1

Citer

A. Caillard, N. Semmar, M El'Mokh, T. Lecas, A.-L Thomann. INCREASE OF THE NICKEL TARGET TEMPERATURE IN MAGNETRON SPUTTERING. Journées Nationales sur les Technologies Emergentes en micronanofabrication (JNTE), Nov 2017, Orléans, France. ⟨hal-01920292⟩
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