Skip to Main content Skip to Navigation
Journal articles

On-Wafer Series-Through Broadband Measurement of Sub-fF55-nm MOS RF Voltage-Tunable Capacitors

K. Daffe G. Dambrine 1, 2 C. Durand 3 C. Gaquiere 1, 4 K. Haddadi 1, 5
2 ANODE - IEMN - Advanced NanOmeter DEvices - IEMN
IEMN - Institut d’Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520
4 PUISSANCE - IEMN - Puissance - IEMN
IEMN - Institut d’Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520
5 CSAM - IEMN - Circuits Systèmes Applications des Micro-ondes - IEMN
IEMN - Institut d’Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520, Institut TELECOM/TELECOM Lille1
Abstract : The objective of this letter oriented towards microwave measurement of high impedance devices using a conventional on-wafer probe station is multiple. First, we provided a quantification of the measurement uncertainty inherent to the setup when measuring capacitors in the range 0.01-10 fF using both reflection and transmission methods up to 50 GHz. In particular, we demonstrate a clear improvement when using transmission method in series-through configuration. As a practical demonstration, on-wafer MOS voltage-tunable capacitors with capacitances ranging from 0.85 to 1.15 fF are extracted with uncertainties of 130 and 2 aF respectively for both reflection and transmission measurements at 10 GHz. Capacitance fluctuation related to the technological process in the order of 20 aF is then exemplary demonstrated using the series-through configuration. Index Terms-sub-fF MOS varactor, measurement accuracy, on-wafer calibration, vector network analyzer (VNA), two-port measurement, coplanar waveguide (CPW).
Complete list of metadata

Cited literature [10 references]  Display  Hide  Download

https://hal.archives-ouvertes.fr/hal-01873048
Contributor : Gilles Dambrine <>
Submitted on : Wednesday, September 12, 2018 - 6:06:31 PM
Last modification on : Monday, September 6, 2021 - 11:54:03 AM
Long-term archiving on: : Thursday, December 13, 2018 - 3:52:19 PM

File

On-Wafer Series-Through Broadb...
Files produced by the author(s)

Identifiers

Citation

K. Daffe, G. Dambrine, C. Durand, C. Gaquiere, K. Haddadi. On-Wafer Series-Through Broadband Measurement of Sub-fF55-nm MOS RF Voltage-Tunable Capacitors. IEEE Microwave and Wireless Components Letters, Institute of Electrical and Electronics Engineers, 2018, 28 (9), pp.831 - 833. ⟨10.1109/LMWC.2018.2851386⟩. ⟨hal-01873048⟩

Share

Metrics

Record views

159

Files downloads

305