X-ray photoelectron spectroscopy and diffraction investigation of a metal–oxide-semiconductor heterostructure: Pt/Gd2O3/Si(111)

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https://hal.archives-ouvertes.fr/hal-01848746
Contributor : Guillaume Saint-Girons <>
Submitted on : Wednesday, July 25, 2018 - 10:29:19 AM
Last modification on : Wednesday, April 3, 2019 - 2:07:09 AM

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D. Ferrah, M. El Kazzi, G. Niu, Claude Botella, J. Penuelas, et al.. X-ray photoelectron spectroscopy and diffraction investigation of a metal–oxide-semiconductor heterostructure: Pt/Gd2O3/Si(111). Journal of Crystal Growth, Elsevier, 2015, 416, pp.118 - 125. ⟨10.1016/j.jcrysgro.2015.02.001⟩. ⟨hal-01848746⟩

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