Ultimate nanopatterning of Si substrate using filtered liquid metal alloy ion source-focused ion beam

Abdelmalek Benkouider (1) , Isabelle Berbezier (1) , A. Ronda (1) , Luc Favre (1) , E. Ruiz Gomes (1) , I.C. Marcus (2) , I. Alonso (2) , A. Delobbe (3) , P. Sudraud (3)

1 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence
2 ICMAB - Institut de Ciència de Materials de Barcelona
3 ZAC Saint Charles - Orsay Physics

Abstract In this work we study the influence of the major focused ion beam operating parameters: ion chemical species, beam current, lens voltage and ion dose on the ultimate nanopatterning resolution. We propose a two-step process based on first ion milling of a SiO2 sacrificial layer and second SiO2 chemical etching for the fabrication of nanopatterns with ultimate size/density and ad libitum shape. Examples of resulting patterns are presented.

Mots clés: LMAIS-FIB; Milling; Nanopatterning; Nanostructures

Domaines: Matière Condensée [cond-mat]

Abdelmalek Benkouider, Isabelle Berbezier, A. Ronda, Luc Favre, E. Ruiz Gomes, et al.. Ultimate nanopatterning of Si substrate using filtered liquid metal alloy ion source-focused ion beam. Thin Solid Films, 2013, 543, pp.69--73. ⟨10.1016/j.tsf.2013.02.119⟩. ⟨hal-01811410⟩