Dose rate effects in bipolar oxides: Competition between trap filling and recombination

J. Boch (1) , Frédéric Saigné (1) , Antoine Touboul (1) , S. Ducret (1) , F Carlotti (1) , M. Bernard (1) , R. Schrimpf (2) , Frédéric Wrobel (3) , G. Sarrabayrouse (1)

1 CEM2 - Centre d'Electronique et de Micro-optoélectronique de Montpellier
2 Vanderbilt University [Nashville]
3 LPES - Laboratoire de Physique Electronique des Solides

Domaines: Electronique

J. Boch, Frédéric Saigné, Antoine Touboul, S. Ducret, F Carlotti, et al.. Dose rate effects in bipolar oxides: Competition between trap filling and recombination. Applied Physics Letters, 2006, 88 (23), ⟨10.1063/1.2210293⟩. ⟨hal-01803025⟩