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High-quality crystalline yttria-stabilized-zirconia thin layer for photonic applications

Abstract : Functional oxides are considered as promising materials for photonic applications due to their extraordinary and various optical properties. Especially, yttria-stabilized zirconia (YSZ) has a high refractive index (∼2.15), leading to a good confinement of the optical mode in waveguides. Furthermore, YSZ can also be used as a buffer layer to expand toward a large family of oxides-based thin-films heterostructures. In this paper, we report a complete study of the structural properties of YSZ for the development of integrated optical devices on sapphire in telecom wavelength range. The substrate preparation and the epitaxial growth using pulsed-laser deposition technique have been studied and optimized. High-quality YSZ thin films with remarkably sharp x-ray diffraction rocking curve peaks in 10 −3 • range have then been grown on sapphire (0001). It was demonstrated that a thermal annealing of sapphire substrate before the YSZ growth allowed controlling the out-of-plane orientation of the YSZ thin film. Single-mode waveguides were finally designed, fabricated, and characterized for two different main orientations of high-quality YSZ (001) and (111). Propagation loss as low as 2 dB/cm at a wavelength of 1380 nm has been demonstrated for both orientations. These results pave the way for the development of a functional oxides-based photonics platform for numerous applications including on-chip optical communications and sensing.
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Contributor : Guillaume Marcaud Connect in order to contact the contributor
Submitted on : Monday, May 28, 2018 - 10:39:44 AM
Last modification on : Saturday, June 25, 2022 - 10:31:44 PM
Long-term archiving on: : Wednesday, August 29, 2018 - 1:01:03 PM


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Guillaume Marcaud, Sylvia Matzen, Carlos Alonso-Ramos, Xavier Le Roux, Mathias Berciano, et al.. High-quality crystalline yttria-stabilized-zirconia thin layer for photonic applications. Physical Review Materials, American Physical Society, 2018, 2 (3), pp.35202 - 35202. ⟨10.1103/PhysRevMaterials.2.035202⟩. ⟨hal-01801073⟩



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