Directed self-assembly of PS-b-PDMS into 193nm photoresist patterns and transfer into silicon by plasma etching

Gottlieb Oehrlein , Qinghuang Lin , Ying Zhang (1) , Sophie Archambault , Cécile Girardot , Mathieu Salaün (2, 3) , Michael Delalande (3) , Sophie Böhme , Gilles Cunge (3) , Erwine Pargon (3) , Olivier Joubert , Marc Zelsmann

1 NCEPU - State Key Laboratory of Alternate Electrical Power System with Renewable Energy Sources [Beijing]
2 NEEL - OPTIMA - Optique et Matériaux
3 LTM - Laboratoire des technologies de la microélectronique

Domaines: Physique [physics]

Gottlieb Oehrlein, Qinghuang Lin, Ying Zhang, Sophie Archambault, Cécile Girardot, et al.. Directed self-assembly of PS-b-PDMS into 193nm photoresist patterns and transfer into silicon by plasma etching. SPIE Advanced Lithography, 2014, San Jose, United States. ⟨10.1117/12.2047287⟩. ⟨hal-01797999⟩