Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering

Abstract : Radiofrequency reactive magnetron sputtering was used to deposit hydrogenated amorphous silicon carbonitride (a-SiCxNy:H) at 400 °C by sputtering a silicon target under CH4 and N2 reactive gas mixture. Rutherford backscattering spectrometry revealed that the change of reactive gases flow rate (the ratio R = FN2/(FN2+FCH4)) induced a smooth chemical composition tunability from a silicon carbide-like film for R = 0 to a silicon nitride-like one at R = 1 with a large area of silicon carbonitrides between the two regions. The deconvolution of Fourier Transform InfraRed and X-ray photoelectron spectroscopy spectrum highlighted a shift of the chemical environment of the deposited films corresponding to the changes seen by RBS. The consequence of these observations is that a control of refractive index in the range of [1.9–2.5] at λ = 633 nm and optical bandgap in the range [2 eV–3.8 eV] have been obtained which induces that these coatings can be used as antireflective coatings in silicon photovoltaic cells.
Document type :
Journal articles
Complete list of metadatas

https://hal.archives-ouvertes.fr/hal-01774950
Contributor : Stéphanie Bonnefoy <>
Submitted on : Tuesday, April 24, 2018 - 10:56:20 AM
Last modification on : Monday, November 26, 2018 - 3:03:28 PM

Identifiers

Citation

A. Bachar, A. Bousquet, H. Mehdi, G. Monier, C. Robert-Goumet, et al.. Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering. Applied Surface Science, Elsevier, 2018, 444, pp.293 - 302. ⟨10.1016/j.apsusc.2018.03.040⟩. ⟨hal-01774950⟩

Share

Metrics

Record views

145