Novel approach for nano-patterning magnetic tunnel junctions stacks at narrow pitch: A route towards high density STT-MRAM applications

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Communication dans un congrès
2017 IEEE International Electron Devices Meeting (IEDM), Dec 2017, San Francisco, France. IEEE, 2017, 〈10.1109/IEDM.2017.8268517〉
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https://hal.archives-ouvertes.fr/hal-01763666
Contributeur : Antoine Chavent <>
Soumis le : mercredi 11 avril 2018 - 12:18:16
Dernière modification le : samedi 14 avril 2018 - 01:21:52

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V. Nguyen, P. Sabon, J. Chatterjee, L. Tillie, P. Veloso Coelho, et al.. Novel approach for nano-patterning magnetic tunnel junctions stacks at narrow pitch: A route towards high density STT-MRAM applications. 2017 IEEE International Electron Devices Meeting (IEDM), Dec 2017, San Francisco, France. IEEE, 2017, 〈10.1109/IEDM.2017.8268517〉. 〈hal-01763666〉

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