Local structure, composition and electronic properties of rare earth oxide thin films studied using advanced transmission electron microscopy techniques (TEM-EELS)
Résumé
This contribution aims to demonstrate the ability of transmission electron microscopy (TEM) and its associated techniques, high-resolution transmission electron microscopy (HRTEM) and electron energy loss spectroscopy (EELS), to contribute to the understanding of the structural, chemical and electronic properties at the nanometre level of rare earth oxide (REO) thin films in the context of their potential use as alternative gate dielectrics to SiO2. A review of the existing work on binary REO and a preliminary work on atomic layer deposited (ALD) Lu2O3/Si stack as-grown and annealed are proposed.