Direct current microhollow cathode discharges on silicon devices operating in argon and helium

Ronan Michaud (1) , Valentin Felix (1) , Arnaud Stolz (1) , Olivier Aubry (1) , Philippe Lefaucheux (1) , Sebastian Dzikowski (2) , Volker Schulz-von Der Gathen (3) , Lawrence Overzet (4) , Rémi Dussart (1)

1 GREMI - Groupe de recherches sur l'énergétique des milieux ionisés
2 RUB - Ruhr University Bochum = Ruhr-Universität Bochum
3 Institute for Applied Plasma Physics
4 PSAL - Plasma Science and Application Laboratory

Domaines: Micro et nanotechnologies/Microélectronique; Plasmas; Génie des procédés

Ronan Michaud, Valentin Felix, Arnaud Stolz, Olivier Aubry, Philippe Lefaucheux, et al.. Direct current microhollow cathode discharges on silicon devices operating in argon and helium. Plasma Sources Science and Technology, 2018, 27 (2), pp.025005. ⟨10.1088/1361-6595/aaa870⟩. ⟨hal-01701973⟩