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Reused of Slurry By Membrane Processes for Microelectronic Industry

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https://hal.archives-ouvertes.fr/hal-01656407
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Submitted on : Tuesday, December 5, 2017 - 4:06:37 PM
Last modification on : Thursday, January 23, 2020 - 6:22:12 PM

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  • HAL Id : hal-01656407, version 1

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Fabrice Testa, Clémence Coetsier, Emilie Carretier, M. Ennahali, Benoit Laborie, et al.. Reused of Slurry By Membrane Processes for Microelectronic Industry. Water today, 2017, 123, pp.311-320. ⟨hal-01656407⟩

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