Embedded spectroscopic reflectometry metrology on FEOL silicon dioxide trench polishing equipment: ER: Equipement reliability and productivity enhancements

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https://hal.archives-ouvertes.fr/hal-01622569
Contributor : Gaëlle Georges <>
Submitted on : Tuesday, October 24, 2017 - 2:47:44 PM
Last modification on : Thursday, October 17, 2019 - 12:36:33 PM

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  • HAL Id : hal-01622569, version 1

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Sophia Bourzgui, Agnès Roussy, Jakey Blue, Gaëlle Georges, Emilie Faivre, et al.. Embedded spectroscopic reflectometry metrology on FEOL silicon dioxide trench polishing equipment: ER: Equipement reliability and productivity enhancements. Advanced Semiconductor Manufacturing Conference (ASMC), 2017 28th Annual SEMI, May 2017, Saratoga Springs, United States. ⟨hal-01622569⟩

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