Cavity-hollow cathode-sputtering source for titanium films

R. Schrittwieser , C. Ionita , A. Murawski , C. Maszl , M. Asandulesa (1) , A. Nastuta , G. Rusu , Claire Douat (2) , S. Olenici , I. Vojvodic , M. Dobromir (3) , D. Luca , S. Jaksch , P. Scheier (4)

1 “Petru Poni” Institute of Macromolecular Chemistry
2 UP11 - Université Paris-Sud - Paris 11
3 "Alexandru Ioan Cuza" University of Iasi - Faculty of Physics
4 Institut für Ionenphysik und Angewandte Physik - Institute for Ion Physics and Applied Physics [Innsbruck]

Domaines: Physique des plasmas [physics.plasm-ph]

R. Schrittwieser, C. Ionita, A. Murawski, C. Maszl, M. Asandulesa, et al.. Cavity-hollow cathode-sputtering source for titanium films. Journal of Plasma Physics, 2010, 76 (3-4), ⟨10.1017/S0022377809990900⟩. ⟨hal-01610893⟩