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Article Dans Une Revue Journal of Physics D: Applied Physics Année : 2013

Radio-frequency capacitively coupled plasmas excited by tailored voltage waveforms: comparison of experiment and particle-in-cell simulations

Pierre-Alexandre Delattre
  • Fonction : Auteur
Erik Johnson
Jean-Paul Booth

Résumé

Using a range of different diagnostics we have performed a detailed experimental characterization of a capacitively coupled rf plasma discharge excited by tailored voltage waveforms in argon (3?13 Pa). The applied pulse-type tailored waveforms consist of between 1 and 5 harmonics (with a fundamental of 15 MHz), and are used to generate an electrically asymmetric plasma response, manifested by the formation of a strong dc bias in the geometrically symmetric reactor used. Experimental measurements of the dc bias, electron density, ion current density, ion-flux energy distributions at the electrodes and discharge current waveforms, are compared with a one-dimensional particle-in-cell simulation for the same operating conditions. The experimental and simulation results are found to be in good agreement over the range of parameters investigated, and demonstrate a number of unique features present with pulse-type tailored waveforms, including: increased plasma density and ion flux with the number of harmonics, and a broader control range of the ion bombarding energy.
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Dates et versions

hal-01549413 , version 1 (28-06-2017)

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Pierre-Alexandre Delattre, Trevor Lafleur, Erik Johnson, Jean-Paul Booth. Radio-frequency capacitively coupled plasmas excited by tailored voltage waveforms: comparison of experiment and particle-in-cell simulations. Journal of Physics D: Applied Physics, 2013, 46, pp.235201. ⟨10.1088/0022-3727/46/23/235201⟩. ⟨hal-01549413⟩
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