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Article Dans Une Revue Plasma Sources Science and Technology Année : 2016

Controlling the shape of the ion energy distribution at constant ion flux and constant mean ion energy with tailored voltage waveforms

Bastien Bruneau
  • Fonction : Auteur
Jean-Paul Booth
Erik Johnson

Résumé

In this paper, we investigate the excitation of a capacitively coupled plasma using a non-sinusoidal voltage waveform whose amplitude- and slope-asymmetry varies continuously with a period which is a multiple of the fundamental RF period. We call this period the ?beating? period. Through particle-in-cell (PIC) simulations, we show that such waveforms cause oscillation of the self-bias at this beating frequency, corresponding to the charging and discharging of the external capacitor. The amplitude of this self-bias oscillation depends on the beating period, the value of the external capacitor, and the ion flux to the electrodes. This self-bias oscillation causes temporal modulation of the ion flux distribution function (IFDF), albeit at a constant ion flux and constant mean ion energy, and allows the energy width of the IFDF (averaged over the beating period) to be varied in a controlled fashion.
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Dates et versions

hal-01549334 , version 1 (28-06-2017)

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Bastien Bruneau, Trevor Lafleur, Jean-Paul Booth, Erik Johnson. Controlling the shape of the ion energy distribution at constant ion flux and constant mean ion energy with tailored voltage waveforms. Plasma Sources Science and Technology, 2016, 25 (2), pp.025006. ⟨10.1088/0963-0252/25/2/025006⟩. ⟨hal-01549334⟩
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